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Analysis of USP Method <467> Residual Solvents on the Agilent 8890 GC System

 

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Application Note Biopharma/Pharma Analysis of USP <467> Residual Solvents Using the Agilent 8697XL Headspace Sampler and Agilent 8890 GC Author Youjuan Zhang Agilent Technologies, Shanghai, China Abstract This application note demonstrates the analysis of United States Pharmacopeia (USP) <467> class…
Klíčová slova
coelutes, coelutesxylene, xylenemibk, mibkwax, waxtra, tracumene, cumenemethyl, methylcyclopentyl, cyclopentylacetonitrile, acetonitrileresponse, responsetetrahydrofuran, tetrahydrofuranisobutyl, isobutylmethylcyclohexane, methylcyclohexanebutanol, butanoltetralin
Residual solvents analysis using an Agilent Intuvo 9000 GC system Technology advantage: simplified dual column analysis with Flow Chip modularity Introduction USP <467> defines a method for analysis of residual solvents in pharmaceuticals. The choice of solvent during product manufacturing…
Klíčová slova
xylene, xylenewax, waxrsd, rsdagilent, agilentmethylene, methylenedual, dualcoleutes, coleutesarea, areamethylcyclohexane, methylcyclohexanechloride, chloriderepeatability, repeatabilitytime, timevial, vialcoelutes, coelutescyclohexane
Application Note Pharmaceutical Small Molecules Residual Solvents Analysis Using an Agilent Intuvo 9000 GC with 8697 Headspace Sampler Author Ian Eisele Agilent Technologies, Inc. Abstract In accordance with United States Pharmacopeia (USP) <467>, residual solvent analysis was performed on an…
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loop, loopwax, waxresidual, residualsolvents, solventscpme, cpmemethylisobutylketone, methylisobutylketonevial, vialcyclopentyl, cyclopentylprocedure, procedurechip, chiptime, timeheadspace, headspaceinlet, inletfill, fillsplit
Analysis of USP <467> Residual Solvents using Agilent J&W DB‑WAX Ultra Inert Capillary GC Columns Following USP <467> Residual Solvents Procedure B Application Note Pharmaceutical Authors Abstract Yun Zou and Weihua Jia This application note highlights the excellent performance of…
Klíčová slova
wax, waxxylene, xyleneresidual, residualagilent, agilentsolvents, solventsfid, fiddichloromethane, dichloromethanemethylcyclohexane, methylcyclohexaneacetonitrile, acetonitrilecyclohexane, cyclohexanemin, minpyridine, pyridinechlorobenzene, chlorobenzenetetrahydrofuran, tetrahydrofurandeactivated
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