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Measuring Inorganic Impurities in Semiconductor Manufacturing

Příručky | 2022 | Agilent TechnologiesInstrumentace
GC, ICP/MS, Speciační analýza, ICP/MS/MS
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Agilent Technologies
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5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
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Agilent ICP-MS Journal (February 2015 – Issue 60)
2015|Agilent Technologies|Ostatní
Agilent ICP-MS Journal February 2015 – Issue 60 Inside this Issue 2-3 An Analyst's Perspective: 8800 ICP-QQQ in the Semiconductor Industry 4-5 Characterization of Nanoparticles in Consumer Products and Water Samples using CE-ICP-MS 6 Investigation of Aviation Gasoline for…
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Application Note Semiconductor Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ Sub-ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method Authors Introduction William M. Geiger, Blake McElmurry, Jesus Anguiano1 Mark…
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Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ Application note Semiconductor and petrochemical Authors William Geiger CONSCI, Ltd., Pasadena, Texas, USA Emmett Soffey, Steve Wilbur and Chris Scanlon Agilent Technologies Inc., USA Introduction Hydride gases, such as phosphine and…
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